LAUNAY, NICOLAS (Total 21 Patents Found)

Approaches for managing machine-to-machine (M2M) wireless devices are disclosed. M2M wireless devices may be configured to utilize service classes in order to implement network access policy control. Packets generated by an application running on the wireless device are inspected, for example using Deep Packet Inspecti...
The present invention provides apparatus for controlling the operation of plasma etching a semiconductor substrate by an alternating etching method, the apparatus comprising: a process chamber ( 1 ) in which said substrate ( 2 ) is processed, means for generating a plasma ( 6 ); at least one first window ( 7...
Approaches for managing machine-to-machine (M2M) wireless devices are disclosed. M2M wireless devices may be configured to utilize service classes in order to implement network access policy control. Packets generated by an application running on the wireless device are inspected, for example using Deep Packet Inspecti...
La présente invention a pour objet un dispositif de contrôle de l'opération de gravure par plasma d'un substrat semiconducteur par la méthode de gravure alternée, comportant une chambre de procédé (1) dans laquelle est traité ledit substrat (2), un moyen de génération d'un plasma (6), au mo...
본 발명에 따르면 실리콘 기판 내의 하나 이상의 요소를 플라즈마 에칭하는 방법이 제공되는데, 상기 방법은 증착 단계와 에칭 단계가 교대로 반복되는 사이클릭 에칭 공정을 이용하여 메인 에칭을 수행하는 단계; 및 상기 요소의 플라즈마 ...
30,281. Fortunesco, N. J., and Launay, E. B. de. Dec. 30. Bottles, non-refillable.-Bottles with ordinary necks are slightly ground internally and provided with a plug containing a top-shaped valve. The plug consists of a valve seat B and a baffle A provided with sloping inlets a so that liquid forced in under pressure ...
The present invention provides apparatus for controlling the operation of plasma etching a semiconductor substrate by an alternating etching method, the apparatus comprising: a process chamber ( 1 ) in which said substrate ( 2 ) is processed, means for generating a plasma ( 6 ); at least one first window ( 7...
The present invention provides apparatus for controlling the operation of plasma etching a semiconductor substrate by an alternating etching method, the apparatus comprising: a process chamber ( 1 ) in which said substrate ( 2 ) is processed, means for generating a plasma ( 6 ); at least one first window ...
La présente invention a pour objet un dispositif de contrôle de l'opération de gravure par plasma d'un substrat semiconducteur par la méthode de gravure alternée, comportant - une chambre de procédé (1) dans laquelle est traité ledit substrat (2), - un moyen de génération d'un plasma (6), - au moi...
La présente invention a pour objet un dispositif de contrôle de l'opération de gravure par plasma d'un substrat semiconducteur par la méthode de gravure alternée, comportant- une chambre de procédé (1 ) dans laquelle est traité ledit substrat (2),- un moyen de génération d'un plasma (6),- au moins...